of the most significant technological applications of LB films for
the goals of microelectronics is the production of super thin high
sensitive plasma resistant UV and electron beam resists. Cyanoacrylates
are very perspective materials among the compounds used for deposition
of LB resists. The sensitivity of some polycyanoacrylate electron
beam resists reaches the value of 10-7 C/cm2.
Introduction of several groups containing Si atoms into hydrophobic
tail increases the stability of the film to plasma etching to such
an extent to enable the usage of 10 nm thick layer in real technological
When using polycyanoacrylate films as UV resists, the LB technique
gives the possibility to deposit an LB layer of sensitizer over
the resist layer and to attain in this way a satisfactory sensitivity
and the value of contrast of 1.5 with the thickness of the resist
film of 50-60 nm.
and N.K.Matveeva. - Polycyanoacrylate Electron
Beam Resists Deposited by Langmuir-Schaefer Technique. -
Thin Solid Films, (1998), 327-329, 659-662.
V.I.Troitsky, V.Castelvetro, M.P.Fontana. - Electron
beam sensitive LB films of fluorocarbon polymer. - Materials
Science & Engineering, (2002), C 22, 295-299.