Mask is produced
by photo- or electron beam lithography techniques (a).
Prepolymer is poured onto master pattern (b) and peeled away
from the master (c). The stamp is inked with alkanethiol (d) and
used to transfer the alkanethiol to the gold surface (e). This
transfer forms a patterned self-assembled monolayer (f). After
this step there are two possibilities. To obtain surface
patterned with protein, self-assembly of protective monolayer 2
is first carried out (g) and then protein selectively adsorbs
onto monolayer 1 (h). To obtain pattern in silicon, gold is
etched through the mask produced by monolayer 1 (i) and then
silicon is etched selectively through the gold mask (j). Finally
the same substrate can be prepared for further treatments (k).